| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to radiation, excellent in basic physical properties as a resist such as sensitivity, resolving power, resistance to dry etching and pattern shape and especially excellent in solubility to resist solvents and reducing line edge roughness of a pattern after development. <P>SOLUTION: The acrylic polymer comprises a recurring unit having an alicyclic hydrocarbon structure having a fluorinated alkyl group as a substituent group and containing a lactone skeleton. The recurring unit having the alicyclic hydrocarbon structure is particularly at least one recurring unit selected from recurring units represented by formulas (1) and (2). <P>COPYRIGHT: (C)2005,JPO&NCIPI |
