发明名称 |
SEMICONDUCTOR PRODUCTION SYSTEM AND SEMICONDUCTOR PRODUCTION PROCESS |
摘要 |
<p>A semiconductor production system comprising a section for processing a substrate to fabricate a semiconductor device thereon, a passage for supplying the processing section with fluid required for processing the substrate, a section for outputting a set voltage corresponding to a set flow rate of the fluid, a mass flow controller located in the fluid supply passage and regulating flow rate of the fluid based on the set voltage, a first shut-off valve located on the upstream side of the mass flow controller in the fluid supply passage, and a second shut-off valve located on the downstream side of the mass flow controller in the fluid supply passage. The mass flow controller comprises a section for detecting actual flow rate of the fluid and outputting a corresponding detection voltage, a section for comparing the set voltage with the detection voltage and outputting an operation signal, and a section for regulating flow rate of the fluid based on the operation signal. Furthermore, a storage section is provided to store, a detection voltage being outputted from the detecting section of the mass flow controller when the first and second shut-off valves are closed. A correcting section is provided to correct the set voltage based on the detection voltage stored in the storage section to compensate for a variation in detection voltage when the actual flow rate of fluid is zero.</p> |
申请公布号 |
WO2005008350(A1) |
申请公布日期 |
2005.01.27 |
申请号 |
WO2004JP10033 |
申请日期 |
2004.07.14 |
申请人 |
TOKYO ELECTRON LIMITED;OKABE, TSUNEYUKI;KANEKO, KENGO |
发明人 |
OKABE, TSUNEYUKI;KANEKO, KENGO |
分类号 |
G01F1/00;G05D7/06;H01L21/205;H01L21/22;(IPC1-7):G05D7/06 |
主分类号 |
G01F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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