发明名称 Photopolymer material based profile transfer system - for foundry use
摘要 <p>Prodn. of shapes and objects of complicated surface geometry or structure and transfer of their shape by means of photopolymers in film, plate block or any other form consists of a mask with the required surface structure or geometry in the form of a hole pattern and non permeable to radiation being placed on the photopolymer material, followed by radiation of the material, chemical removal of the non-radiated areas, following which the surface geometry or structure transfer has been effected. The process can be used in foundries for transfer of surface patterns e.g. in the Unicast (RTM) process.</p>
申请公布号 DE2029325(A1) 申请公布日期 1971.12.23
申请号 DE19702029325 申请日期 1970.06.13
申请人 发明人
分类号 G03F7/00 主分类号 G03F7/00
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