| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma generation method surely generating a plasma at low cost. <P>SOLUTION: The plasma generation method is composed of a process of preparing a plasma generation device 1 including a power impressing electrode 11 having a first terminal part 11t; a grounding electrode 13 having a second terminal part 13t, to be located apart from the power impressing electrode 11; an insulation body 12a to be installed between the power impressing electrode 11 and the grounding electrode 13; a stage 19 as a supporting member supporting a substrate 18, to be installed in a manner of facing with the first terminal part 11t and the second terminal part 13t; and a coated dielectric body 112 covering the first terminal part 11t and the second terminal part 13t; and a process of generating the plasma 17 by impressing a potential difference between the power impressing electrode 11 and the grounding electrode 13, and by supplying mixed gas which is a mixture of air and not less than 30 vol.% of inert gas between the first terminal part 11t and the second terminal part 13t. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
