发明名称 Electro-optical device and thin film transistor and method for forming the same
摘要 A semiconductor device having a pair of impurity doped second semiconductor layers, formed on a first semiconductor layer having a channel formation region therein, an outer edge of the first semiconductor film being at least partly coextensive with an outer edge of the impurity doped second semiconductor layers. The semiconductor device further includes source and drain electrodes formed on the pair of impurity doped second semiconductor layers, wherein the pair of impurity doped second semiconductor layers extend beyond inner sides edges of the source and drain electrodes so that a stepped portion is formed from an upper surface of the source and drain electrodes to a surface of the first semiconductor film.
申请公布号 US2005017243(A1) 申请公布日期 2005.01.27
申请号 US20040925984 申请日期 2004.08.26
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 ZHANG HONGYONG;KUSUMOTO NAOTO
分类号 H01L21/265;G02F1/1362;H01L21/20;H01L21/268;H01L21/336;H01L29/78;H01L29/786;(IPC1-7):H01L29/04 主分类号 H01L21/265
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