METHOD AND SYSTEM FOR DETERMINING A COMPONENT CONCENTRATION OF AN INTEGRATED CIRCUIT FEATURE

摘要

A method of determining a composition of an integrated circuit feature, including collecting intensity data representative of spectral wavelengths of radiant energy generated by a plasma during plasma nitridation of an integrated circuit feature disposed on a substrate, analyzing the intensity data to determine a peak intensity at one of the wavelengths, and determining a component concentration of the feature based on the peak intensity.