发明名称 Capacitor with enhanced performance and method of manufacture
摘要 A decoupling capacitor is formed in a semiconductor substrate that includes a strained silicon layer. A substantially flat bottom electrode is formed in a portion of the strained silicon layer and a capacitor dielectric overlying the bottom electrode. A substantially flat top electrode overlies said capacitor dielectric. The top electrode is connected to a first reference voltage line and the bottom electrode is connected to a second reference voltage line.
申请公布号 US2005018380(A1) 申请公布日期 2005.01.27
申请号 US20030627218 申请日期 2003.07.25
申请人 YEO YEE-CHIA;HU CHENMING 发明人 YEO YEE-CHIA;HU CHENMING
分类号 H01L21/02;H01L27/08;H01L29/94;(IPC1-7):H01G4/228 主分类号 H01L21/02
代理机构 代理人
主权项
地址