| 摘要 |
<p>The method involves providing a mask with a defined pattern in an object plane of a projection objective (5) and a light-sensitive substrate (10) near the image plane (12), illuminating the pattern with ultraviolet light of defined working wavelength, projecting an image of the pattern onto the substrate, setting a finite working distance (16) between an illumination light output surface (15) and an input coupling surface (11) and setting the working distance at least temporarily to less than the maximum size of an optical near field of the emanating light . An independent claim is also included for the following: (a) a projection illumination system.</p> |
