发明名称 ELECTRON BEAM IRRADIATION APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an electron beam irradiation apparatus at a low cost capable of totally irradiating not only a surface in a recessed part but also a surface of an article with an electron beam even in an electronic beam irradiation processing object article length in a constant direction and having a recessed part such as hollows and recessed parts at any one end or both ends in the longitudinal direction. <P>SOLUTION: The electron beam irradiation apparatus A1 is provided with an electron beam irradiation unit 1; and conveyors 2C, 2C' arranged so as to face to electron beam irradiation windows 12, 12' of the unit 1 and conveying the article W in opposite direction with each other. In the electron beam irradiation apparatus A1, the respective conveyors can convey the article W while rotating it, an article conveying surface of the conveyor 2C includes an inclination part inclined at left-down/right up around an axis CL of the direction viewed from the article conveying direction X and an article conveying surface of the conveyor 2C' includes an inclination part inclined in an opposite direction to the inclination of the inclination part of the conveyor 2C. The electron beam irradiation apparatus A2 has an electron beam irradiation unit 1' and a conveyor 2'. An article conveying surface of the conveyor 2' is inclined in a left/right direction around an axis in the article conveying direction. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005021763(A) 申请公布日期 2005.01.27
申请号 JP20030187929 申请日期 2003.06.30
申请人 NHV CORPORATION 发明人 AKITA KEIZO
分类号 G21K5/04;A23B7/00;A23L3/26;A61L2/08;B01J19/12;B65G17/24;B65G39/20;B65G47/28;G21K5/10 主分类号 G21K5/04
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