| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device which can perform accurate exposing by well conducting a stage position measurement corresponding to enlargement of the stage and lengthening of its moving stroke without enlarging a column. SOLUTION: The exposure device includes a base plate, the column supported to the base plate to support a projection optical system via a surface plate 1, a laser interferometer provided in the column to measure relative position information in a Y-axis direction of the projection optical system PL, a laser interferometer for measuring relative position information in an X-axis direction of the projection optical system PL, and a controller for obtaining reference position information of the projection optical system PL based on measured results of the respective laser interferometers. COPYRIGHT: (C)2005,JPO&NCIPI |
