| 摘要 |
PROBLEM TO BE SOLVED: To provide a misalignment measuring method having high measuring precision, a misalignment measuring device, and a mark. SOLUTION: There are three processes. In a process, a mark section having first and second marks is formed by forming the first and second marks having at least a pair of rising and trailing edges on a substrate, the direction of the rising and falling edges of the first mark becomes the same as that of those of the second one, and the interval between the rising and falling edges of the first mark becomes equal to that between the rising and falling edges of the second one. In a process, the mark section is successively positioned at first and second observation points separated by distance corresponding to the interval in a visual field region at an image capturing section for capturing the image of the mark section. In a process, the amount of misalignment between the first and second marks is calculated, based on an image captured when positioning is performed at the first observation point and that when positioning is performed at the second one. COPYRIGHT: (C)2005,JPO&NCIPI |
