| 摘要 |
PROBLEM TO BE SOLVED: To ensure exposure having an original refractive index of liquid by suppressing the occurrence of the turbulence of the liquid due to the movement of a stage in a liquid-immersion type aligner. SOLUTION: In an aligner performing exposure in such a state that liquid E is interposed between an optical outgoing end in a lens L and a wafer W that is an object for exposure, there are provided a stage 10 mounting the wafer W and performing relative movement to the lens L in performing exposure, a tank 11 for dipping the entire wafer W mounted on the stage 10 in the liquid E, liquid ejection nozzles N1 and N2 ejecting the liquid E same as the liquid E for generating the flow of the liquid E located between the wafer W on the stage 10 and the optical outgoing end in the lens L, and a control means controlling the ejection of the liquid E from the liquid ejection nozzles N1 and N2 at a speed corresponding to the travel speed of the stage 10 along the traveling direction of the stage 10. COPYRIGHT: (C)2005,JPO&NCIPI
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