发明名称 |
Resistzusammensetzung |
摘要 |
This invention relates to a polymer capable of forming an ultra-fine pattern with excellent rectangular shape in a silylated surface resolution process using a chemically amplified type resist composition as single layer or the most upper layer among multiple layers and to a resist composition using the polymer. The said polymer and resist composition are useful in a silylated surface resolution process, and by conducting the silylated surface resolution process using the said resist composition, contrast of silylation becomes higher and it becomes possible to obtain ultra-fine pattern regardless of the kind of exposure energy. |
申请公布号 |
DE60016836(D1) |
申请公布日期 |
2005.01.27 |
申请号 |
DE2000616836 |
申请日期 |
2000.06.07 |
申请人 |
WAKO PURE CHEMICAL INDUSTRIES, LTD. |
发明人 |
HUJIE, HIROTOSHI;MAESAWA, TSUNEAKI;MORI, YASUYOSHI |
分类号 |
C08F8/12;C08F212/14;G03F7/004;G03F7/039 |
主分类号 |
C08F8/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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