| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin having excellent solubility in solvents, a method for producing the resin suitable for a resist composition, the resist composition having high sensitivity and high resolution and slight microgel in a solution, and to provide a method for forming a pattern having the high sensitivity and high resolution using the resist composition. <P>SOLUTION: The copolymer comprises a constituent unit represented by formula (1) (wherein, R denotes a hydrogen atom or a methyl group) and a constituent unit having a specific lactone skeleton. The method for producing the copolymer comprises carrying out polymerization while dropping a solution prepared by dissolving monomers to be the constituent units of the copolymer and a polymerization initiator in an organic solvent into the organic solvent heated at the polymerization temperature. The resist composition comprises the copolymer. The method for forming the pattern comprises a step of coating the top surface of a substrate to be processed with the resist composition, a step of exposing the resist composition to light at ≤250 nm wavelength and a step of carrying out development with a developer. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
