发明名称 SCANNING PROJECTION ALIGNER AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To provide a scanning projection aligner in which distortion or an image plane is easily adjusted even after the projection optics is on the aligner body. SOLUTION: The scanning projection aligner is equipped with: an illumination optics to illuminate a first substrate M with a beam emitting from a light source 1; a plurality of partial projection optics PL1 to PL5 to partially project the pattern of the first substrate onto a second substrate P; a first stage mounting the first substrate; and a second stage mounting the second substrate, and carries out scanning exposure by synchronously moving the first stage and the second stage in the scanning direction. In this aligner, each of the plurality of partial projection optics PL1 to PL5 is equipped with an imaging optics containing a refractive optics and a concave reflective mirror, a first deflecting member to guide the light from the first substrate to the imaging optics, a second deflecting member to guide the light through the imaging optics to the second substrate, and a distortion adjusting member disposed in at least either the optical path between the first substrate and the first deflecting member or the optical path between the second deflecting member and the second substrate. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005024584(A) 申请公布日期 2005.01.27
申请号 JP20030186655 申请日期 2003.06.30
申请人 NIKON CORP 发明人 KATO MASANORI;HATADA HITOSHI
分类号 G02B17/08;G03F7/207;H01L21/027;(IPC1-7):G03F7/207 主分类号 G02B17/08
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