Photomask and integrated circuit manufactured by automatically eliminating design rule violations during construction of a mask layout block

摘要

A photomask and integrated circuit manufactured by eliminating design rule violations during construction of a mask layout block are disclosed. A photomask includes a substrate and a patterned layer including at least one feature formed on at least a portion of the substrate. The feature is defined in a mask pattern file generated by analyzing a selected position for a polygon during construction of a mask layout block and determining if the selected position creates a design rule violation in the mask layout block based on a design rule from a technology file. The mask pattern file is further generated by automatically preventing the polygon from being placed in the mask layout block at the selected position if the design rule violation exists.