MASK WITH DIFFERENT LAYERS OVERLAID WITH EACH OTHER AND METHOD OF DESIGNING THE SAME FOR OBTAINING THE SAME CD AS DESIGN RULE FROM REAL PATTERN IN POLY/ACTIVE OVERLAID PORTION

摘要

PURPOSE: A mask with different layers overlaid with each other and a method of designing the same are provided to obtain the same CD(Critical Dimension) as a design rule from a real pattern in a poly/active overlaid portion by forming selectively an auxiliary pattern on the poly/active overlaid portion. CONSTITUTION: A poly layer(100) is overlaid on an active layer(200). An optical proximity correction pattern is formed on the poly layer. A first pattern for compensating initial bias is formed along a lower line of the active layer. A second pattern for allocating new bias is formed under the active layer to a poly layer formed direction. A third pattern for allocating new bias is formed on the poly layer to an active layer formed direction. A horizontal and vertical pattern(10,20) are decisively defined.