发明名称 Marking method and marking apparatus using multiple photon absorption, marked optical element manufactured by using the marking method and the marking apparatus
摘要 A marking method is provided which permits an easy detecting of the presence of a mark without using a specific reading apparatus, and is capable of avoiding a damage as well as a strength deterioration of an object material. The marking method comprises: preparing a marking object; converging, into the marking object, a laser beam having a wave length range so chosen that the laser beam can transmit through a material forming the marking object, and then effecting a multiple photon absorption; and moving a converging position of the laser beam, in a manner such that an area, whose refractive index is changed due to the multiple photon absorption, can form a diffraction pattern capable of diffracting a visible light.
申请公布号 US2005016973(A1) 申请公布日期 2005.01.27
申请号 US20040921848 申请日期 2004.08.20
申请人 SUMITOMO HEAVY INDUSTRIES, LTD. 发明人 HAYASHI KEN-ICHI;ITOH KAZUYOSHI
分类号 B41J3/00;B23K26/00;B41M5/26;G02B5/18;(IPC1-7):B23K26/00 主分类号 B41J3/00
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