发明名称 Microlithographic projection illumination system projection objective has gray filter with locally varying gray value for compensating polarization distribution disturbance caused by optical element
摘要 <p>The projection objective has a first optical element (L2) that produces a disturbance of the polarization distribution of the projection light (22) and a second polarizing optical element (28) that is downstream of the first in the propagation direction. The projection objective (10) has a gray filter (32) with a locally varying gray value for compensating the polarization distribution disturbance.</p>
申请公布号 DE10329793(A1) 申请公布日期 2005.01.27
申请号 DE2003129793 申请日期 2003.07.01
申请人 CARL ZEISS SMT AG 发明人 GRUNER, TORALF;MANN, HANS-JUERGEN
分类号 G02B13/14;G02B17/08;G02B27/28;G03F7/20;(IPC1-7):G02B13/14 主分类号 G02B13/14
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