Apparatus and method for chemical cleaning and etching of discrete disk-shaped substrates

摘要

The method involves cleaning and etching of disc-shaped individual substrates (7) in a closed processing chamber. The substrate to be processed is acquired by a substrate holder (3), set rotating and simultaneously sprayed with chemical on both sides. The process chamber consists of at least two halves (1,2) that move with respect to each other to open and close the chamber. Independent claims are also included for: an arrangement for implementing the method.