| 发明名称 |
METHOD FOR PRODUCING SEMICONDUCTOR DEVICE |
| 摘要 |
After a fluid film is formed by supplying a material with fluidity to the surface of a substrate formed with a stepped layer, the fluid film is pressed against the substrate by a pressing member having a planar pressing surface so that the surface of the fluid film is planarized. The fluid film is heated in this state and thereby solidified to form a solidified film having a planar surface. <IMAGE> |
| 申请公布号 |
EP1341224(A4) |
申请公布日期 |
2005.01.26 |
| 申请号 |
EP20010974736 |
申请日期 |
2001.10.09 |
| 申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
NAKAGAWA, HIDEO;SASAGO, MASARU;ENDO, MASAYUKI;HIRAI, YOSHIHIKO |
| 分类号 |
H01L21/027;H01L21/3105;H01L21/312;H01L21/316;H01L21/768 |
主分类号 |
H01L21/027 |
| 代理机构 |
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