发明名称 Lithographic apparatus and device manufacturing method
摘要 In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate of the lithographic projection apparatus. A sensor positioned on a substrate table which holds the substrate is adapted for being imaged when immersed in immersion liquid (i.e. under the same conditions as the substrate will be imaged). By ensuring that a primary outer surface of an absorption element of the sensor is formed of one or fewer metal types, long life of the sensor can be expected. <IMAGE>
申请公布号 EP1500986(A1) 申请公布日期 2005.01.26
申请号 EP20040254151 申请日期 2004.07.12
申请人 ASML NETHERLANDS B.V. 发明人 SENGERS, TIMOTHEUS FRANCISCUS;DONDERS, SJOERD NICOLAAS LAMBERTUS;JANSEN, HANS;BOOGAARD, ARJEN
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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