发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate of the lithographic projection apparatus. A sensor positioned on a substrate table which holds the substrate is adapted for being imaged when immersed in immersion liquid (i.e. under the same conditions as the substrate will be imaged). By ensuring that a primary outer surface of an absorption element of the sensor is formed of one or fewer metal types, long life of the sensor can be expected. <IMAGE> |
申请公布号 |
EP1500986(A1) |
申请公布日期 |
2005.01.26 |
申请号 |
EP20040254151 |
申请日期 |
2004.07.12 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
SENGERS, TIMOTHEUS FRANCISCUS;DONDERS, SJOERD NICOLAAS LAMBERTUS;JANSEN, HANS;BOOGAARD, ARJEN |
分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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