发明名称 Electrical discharge gas plasma EUV source insulator components
摘要 A diamond insulator collar and methods for fabricating a diamond insulator collar for electrical discharge gas plasma EUV source. The insulating collar is positioned at the base of the central electrode in the pre-ionization region of the plasma head. The insulating collar prevents electrical shorting between the outer electrode and the central electrode in this region. In one embodiment of a method for providing a wire mesh-reinforced diamond insulator collar, a mandrel is provided that replicates the shape of the base of the central electrode. A wire mesh is wrapped around the mandrel conforming to the shape of the mandrel. The wire mesh is coated with electrically insulating diamond using known plasma enhanced chemical vapor deposition (CVD) techniques to form a non-porous coating. The mandrel is removed from the diamond-coated wire mesh providing a porous-free wire-reinforced diamond insulator collar. Embodiments of non-wire reinforced collars are presented.
申请公布号 US6847044(B2) 申请公布日期 2005.01.25
申请号 US20020335094 申请日期 2002.12.31
申请人 INTEL CORPORATION 发明人 RICE BRYAN J.;RAVI KRAMADHATI V.
分类号 G03F7/20;H01J61/04;H05G2/00;(IPC1-7):H01J61/04 主分类号 G03F7/20
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