发明名称 A-C:H ISFET device, manufacturing method, and testing methods and apparatus thereof
摘要 An a-C:H ISFET device and manufacturing method thereof. The present invention prepares a-C:H as the detection membrane of an ISFET by plasma enhanced low pressure chemical vapor deposition (PE-LPCVD) to obtain an a-C:H ISFET. The present invention also measures the current-voltage curve for different pH and temperatures by a current measuring system. The temperature parameter of the a-C:H ISFET is calculated according to the relationship between the current-voltage curve and temperature. In addition, the drift rates of the a-C:H ISFET for different pH and hysteresis width of the a-C:H ISFET for different pH loops are calculated by a constant voltage/current circuit and a voltage-time recorder to measure the gate voltage of the a-C:H ISFET.
申请公布号 US6847067(B2) 申请公布日期 2005.01.25
申请号 US20030419735 申请日期 2003.04.22
申请人 NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY 发明人 CHOU JUNG-CHUAN;TSAI HSUAN-MING
分类号 G01N27/00;G01N27/414;G01R27/00;G01R31/02;H01L21/00;H01L21/04;H01L21/66;H01L23/58;H01L27/14;H01L29/772;H01L31/00;(IPC1-7):H01L23/58 主分类号 G01N27/00
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