| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
In a lithographic projection apparatus, ingress of contaminants to a component is prevented by providing a first flow of purge gas through the inside of a first compartment encapsulating the component and a second flow of purge gas to an external surface of the compartment.
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| 申请公布号 |
US6847430(B2) |
申请公布日期 |
2005.01.25 |
| 申请号 |
US20030354153 |
申请日期 |
2003.01.30 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MERTENS JEROEN JOHANNES SOPHIA MARIA |
| 分类号 |
G03F7/20;H01L21/027;(IPC1-7):G03B27/52;G03B27/42;G03B27/54;G03B27/32 |
主分类号 |
G03F7/20 |
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