CONTACT FORMING METHOD FOR PREVENTING METALLIC PART FROM BEING INCOMPLETELY OPENED

摘要

PURPOSE: A contact forming method is provided to prevent a metallic part of an edge region from being incompletely opened due to etch-stop phenomenon in RIE(Reactive Ion Etching) by etching previously an edge of an insulating layer. CONSTITUTION: An edge of a first insulating layer is etched on a substrate by using a first mask as an etching mask. A plurality of contact holes(13) for exposing predetermined metallic parts to the outside are formed in the first insulating layer by using a second mask as an etching mask. Tungsten is filled in the contact holes and etched.