发明名称 |
Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system |
摘要 |
A semiconductor wafer processing system including a multi-chamber module having vertically-stacked semiconductor wafer process chambers and a loadlock chamber dedicated to each semiconductor wafer process chamber. Each process chamber includes a chuck for holding a wafer during wafer processing. The multi-chamber modules may be oriented in a linear array. The system further includes an apparatus having a dual-wafer single-axis transfer arm including a monolithic arm pivotally mounted within said loadlock chamber about a single pivot axis. The apparatus is adapted to carry two wafers, one unprocessed and one processed, simultaneously between the loadlock chamber and the process chamber. A method utilizing the disclosed system is also provided.
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申请公布号 |
US6846149(B2) |
申请公布日期 |
2005.01.25 |
申请号 |
US20010996869 |
申请日期 |
2001.11.27 |
申请人 |
AVIZA TECHNOLOGY, INC. |
发明人 |
SAVAGE RICHARD N.;MENAGH FRANK S.;CARVALHEIRA HELDER R.;TROIANI PHILIP A.;COSSENTINE DAN L.;VAUGHAN ERIC R.;MAYER BRUCE E. |
分类号 |
G03F7/20;C23C16/54;H01L21/00;H01L21/02;H01L21/31;H01L21/677;H01L21/687;(IPC1-7):B25J15/10;F26B3/08 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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