发明名称 |
METHOD OF CLEANING SCREEN KIT FOR KEEPING SCREEN KIT IN GOOD STATE FOR LONG TIME WITHOUT FILM RESIDUE FOR OBTAINING RELIABLE DATA |
摘要 |
PURPOSE: A method of cleaning a screen kit is provided to keep the screen kit in a good state for a long time without film residue. CONSTITUTION: DI(DeIonized) water, HF and HNO3 are sequentially mixed with each other in the ratio of 5: 4.5: 1 in a clean hood bath. A screen kit is installed in the clean hood bath. Etching is performed on the screen kit, filling and draining is repeated five times in the clean hood bath and an N2 bubbling process is performed on the screen kit. When the DI water is drained off from the clean hood bath through a drain valve, etching radicals are removed from the screen kit by overflowing hot DI water. The screen kit is transferred from the clean hood bath to a bake oven composed of a bottom, middle and top bake oven. Baking processes are sequentially performed on the screen kit in the bottom, middle and top bake ovens(S5).
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申请公布号 |
KR20050009424(A) |
申请公布日期 |
2005.01.25 |
申请号 |
KR20030048734 |
申请日期 |
2003.07.16 |
申请人 |
DONGBUANAM SEMICONDUCTOR INC. |
发明人 |
JUNG, KIL HO;KIM, JI HONG;KIM, SUK BONG |
分类号 |
H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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