METHOD OF INSPECTING FEATURES ON SEMICONDUCTOR SUBSTRATE FOR ADAPTING DETECTION SENSITIVITY FOR PATTERN ELEMENTS ON PATTERNED SEMICONDUCTOR SUBSTRATE

摘要

PURPOSE: A method of inspecting features on a semiconductor substrate is provided to adapt detection sensitivity for pattern elements on a patterned semiconductor substrate by a user. CONSTITUTION: An image acquisition process is performed to acquire an image of at least one semiconductor substrate. The image encompasses a plurality of elements having identical recurring features. An allocating process is performed to allocate at least one ROI to a pattern element in a single element. The ROI is assigned to various parameters for evaluating the acquired image of the semiconductor substrate. A transferring process is performed to transfer automatically the ROI to corresponding pattern elements of the semiconductor substrate in the other elements.