DUAL CHANNEL TYPE GAS INJECTION APPARATUS FOR PREVENTING PRE-REACTION BETWEEN TWO KINDS OF GASES BEFORE INJECTING GASES ONTO WAFER

摘要

PURPOSE: A dual channel type gas injection apparatus is provided to prevent pre-reaction between two kinds of gases before injecting gases onto a wafer by using independent flow paths. CONSTITUTION: A housing(110) has an open bottom side. First and second gas supply tubes(120,130) are used for supplying a first gas and a second gas, respectively. A gas injection plate(140) is coupled to the open bottom side of the housing and the first and the second gas supply tubes in order to inject the first and the second gases. A cooling water control unit(150) controls each of temperatures of the first and the second gases. The gas injection plate is installed at a body(141) and is formed with first and second gas distributors(142,143) for distributing uniformly the first and the second gases, first and second flow paths divided by a barrier rib, and first and second injection holes for injecting the first and the second gases.