发明名称 |
SEMICONDUCTOR DEVICE USING NANO-TUBES AND FABRICATING METHOD INCREASING DEGREE OF INTEGRATION BY USING SELF-ALIGNING METHOD |
摘要 |
PURPOSE: A semiconductor device using nano-tubes and a fabricating method thereof are provided to increase a degree of integration by self-aligning the nano-tubes within a trench. CONSTITUTION: A nano-tube source including a plurality of nano-tubes(30) is prepared. A trench(20) is formed on a substrate in order to define a channel region. The substrate including the trench is vibrated and the nano-tubes are supplied to the vibrating substrate. The nano-tubes are aligned within the trench of the substrate. Each of the nano-tubes is formed with one of a single-wall nano-tube, a multi-wall nano-tube, and a rope nano-tube.
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申请公布号 |
KR20050008128(A) |
申请公布日期 |
2005.01.21 |
申请号 |
KR20030047974 |
申请日期 |
2003.07.14 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHOI, SI YOUNG;KIM, YOUNG PIL |
分类号 |
H01L29/78;(IPC1-7):H01L29/78 |
主分类号 |
H01L29/78 |
代理机构 |
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