发明名称 SEMICONDUCTOR DEVICE USING NANO-TUBES AND FABRICATING METHOD INCREASING DEGREE OF INTEGRATION BY USING SELF-ALIGNING METHOD
摘要 PURPOSE: A semiconductor device using nano-tubes and a fabricating method thereof are provided to increase a degree of integration by self-aligning the nano-tubes within a trench. CONSTITUTION: A nano-tube source including a plurality of nano-tubes(30) is prepared. A trench(20) is formed on a substrate in order to define a channel region. The substrate including the trench is vibrated and the nano-tubes are supplied to the vibrating substrate. The nano-tubes are aligned within the trench of the substrate. Each of the nano-tubes is formed with one of a single-wall nano-tube, a multi-wall nano-tube, and a rope nano-tube.
申请公布号 KR20050008128(A) 申请公布日期 2005.01.21
申请号 KR20030047974 申请日期 2003.07.14
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI, SI YOUNG;KIM, YOUNG PIL
分类号 H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L29/78
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