发明名称 EXTERNAL APPEARANCE INSPECTION APPARATUS, EXTERNAL APPEARANCE INSPECTION METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR CHIP
摘要 PROBLEM TO BE SOLVED: To perform the positioning of an object to be inspected at a high speed, and to detect abnormality on the surface of the object to be inspected in a short time. SOLUTION: An optical beam spread with respect to an X-direction is directed obliquely with respect to a Y-direction, from a relay lens 25 toward the surface of the semiconductor chip accommodated in a tray 2 to be irradiated therewith, and an optical beam spread with respect to the Y-direction is directed obliquely with respect to the X-direction. An area camera 40 acquires an image of the surface of the semiconductor chip, and outputs an image signal to an image processing/controlling device 100. When the semiconductor chip is inclined with respect to a Z-direction, the two optical beams do not perpendicularly cross on the surface of the semiconductor chip, or the intersection point is off the center. When the surface of the semiconductor chip is not at a prescribed height, the intersection point is also off the center. Further, when the semiconductor is displaced or rotated with respect to the X-Y directions, an alignment mark of the surface of the semiconductor chip is off a prescribed position. A CPU 110 detects the position and the rotation of the semiconductor chip with respect to the X-Y-directions and the height and the inclination with respect to the Z-direction, from image data stored in an image memory 120. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005017168(A) 申请公布日期 2005.01.20
申请号 JP20030184115 申请日期 2003.06.27
申请人 HITACHI HIGH-TECH ELECTRONICS ENGINEERING CO LTD 发明人 ISHIMORI HIDEO
分类号 G01B11/30;G01N21/88;(IPC1-7):G01B11/30 主分类号 G01B11/30
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