发明名称 PHOTOCURABLE LIQUID RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photocurable liquid resin composition having excellent photocurability, and providing a cured product having excellent folding resistance and fractional toughness while keeping high forming accuracy and heat resistance. SOLUTION: The photocurable liquid resin composition comprises (A) 20-85 wt.% cationically polymerizable compound, (B) 0.1-10 wt.% cationic polymerization initiator, (C) 5-45 wt.% compound having a structure represented by formula (1) (wherein, R<SP>1</SP>, R<SP>2</SP>and R<SP>3</SP>are each independently an organic group, and at least two of the R<SP>1</SP>, R<SP>2</SP>and R<SP>3</SP>have polymerizable carbon-carbon double bonds), (D) 0.1-10 wt.% radical polymerization initiator and (E) 0-20 wt.% compound having one or more radically polymerizable group in the molecule based on the whole amount of the composition. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005015627(A) 申请公布日期 2005.01.20
申请号 JP20030182094 申请日期 2003.06.26
申请人 JSR CORP;JAPAN FINE COATINGS CO LTD 发明人 YASHIRO TAKAO;TATARA AKITSUGU;TANABE TAKAYOSHI
分类号 C08G59/18;C08F2/46;C08G18/38;C08G59/68;G03F7/00;G03F7/038;(IPC1-7):C08G59/18 主分类号 C08G59/18
代理机构 代理人
主权项
地址