发明名称 |
Masking device, lithographic apparatus, and device manufacturing method |
摘要 |
A lithographic projection apparatus having a masking device for obscuring part of at least one of a patterning device used for patterning a projection beam before imaging the patterned beam onto a substrate. The masking device includes a first masking structure to obscure said part of said patterning device in a first direction and a second masking structure to obscure said part in a second different direction, wherein said first and second masking structure are disposed in the vicinity of said focal plane in a mechanically uncoupled arrangement with respect to each other.
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申请公布号 |
US2005012913(A1) |
申请公布日期 |
2005.01.20 |
申请号 |
US20040855976 |
申请日期 |
2004.05.28 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VERWEIJ ANTOINE HENDRIK;MOLENAAR JACOBUS FREDERIK;VAN DEN HOVEN GERBRAND PETRUS JOHANNES;VERVOORDELDONK MICHAEL JOHANNES;PARDOEL MICHEL GERARDUS;VERDOES GERARDUS JOHANNES |
分类号 |
H01L21/027;G03F7/20;(IPC1-7):G03B27/42 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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