| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a metallic abrasive composition capable of polishing metal such as Ta at a high speed, having high cleaning performance to a hydrophobic low dielectric constant film, and superior in preservation stability without precipitating abrasive grains in storing. <P>SOLUTION: This metallic abrasive composition is characterized by including a anionic surface active agent having two or more anionic functional groups, the abrasive grains, and inorganic salt in a molecular structure. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
