发明名称 |
Thin-film semiconductor substrate, method of manufacturing thin-film semiconductor substrate, method of crystallization, apparatus for crystallization, thin-film semiconductor device, and method of manufacturing thin-film semiconductor device |
摘要 |
A thin-film semiconductor substrate includes an insulative substrate, an amorphous semiconductor thin film that is formed on the insulative substrate, and a plurality of alignment marks that are located on the semiconductor thin film and are indicative of reference positions for crystallization.
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申请公布号 |
US2005012228(A1) |
申请公布日期 |
2005.01.20 |
申请号 |
US20040879165 |
申请日期 |
2004.06.30 |
申请人 |
HIRAMATSU MASATO;KIMURA YOSHINOBU;OGAWA HIROYUKI;JYUMONJI MASAYUKI;MATSUMURA MASAKIYO |
发明人 |
HIRAMATSU MASATO;KIMURA YOSHINOBU;OGAWA HIROYUKI;JYUMONJI MASAYUKI;MATSUMURA MASAKIYO |
分类号 |
H01L29/786;H01L23/544;(IPC1-7):H01L23/544 |
主分类号 |
H01L29/786 |
代理机构 |
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地址 |
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