发明名称 Sulfonate and a resist composition
摘要 A sulfonate of the formula (I): wherein Q<1>, Q<2>, Q<3>, Q<4 >and Q<5 >each independently represents a certain substituent, and A<+> represents a counter ion, with the proviso that at least one of Q<1>, Q<2>, Q<3>, Q<4 >and Q<5 >is a group of the formula (II) wherein R<1 >and R<2 >each independently an alkyl having 1 to 12 carbon atoms or the like; and a chemical amplification type positive resist composition comprising the sulfate of the formula (I) and a resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
申请公布号 US2005014095(A1) 申请公布日期 2005.01.20
申请号 US20040892291 申请日期 2004.07.16
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 YAMAGUCHI SATOSHI;AKITA MAKOTO;YOSHIDA ISAO
分类号 C07C309/29;C07C309/58;C07C323/31;C07C381/12;G03C1/76;G03F7/004;G03F7/039;(IPC1-7):G03C1/76 主分类号 C07C309/29
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