发明名称 |
Vorrichtung zur Photomaskeninspektion mittels Photolithographiesimulation |
摘要 |
<p>A system and method are presented for optical inspection of reticles by simulating the operation of a selected stepper. The system utilizes a flying spot inspection technique and includes a scanning apparatus and a detection unit. The scanning apparatus uses a laser source similar to that of the stepper of interest. First and second light directing assemblies are accommodated in the optical paths of, respectively, incident and transmitted light, and are designed so as to provide coherence of the light substantially equal to that of the stepper. <IMAGE></p> |
申请公布号 |
DE60016682(D1) |
申请公布日期 |
2005.01.20 |
申请号 |
DE2000616682 |
申请日期 |
2000.08.31 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
KARPOL, AVNER;KENAN, BOAZ |
分类号 |
G01N21/956;G03F1/84;G03F7/20;(IPC1-7):G01N21/956 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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