发明名称 SPUTTERING TARGET AND OPTICAL RECORDING MEDIUM
摘要 <p>A Ge(alpha)-In(beta)-Sb(gamma)-Te(delta) alloy sputtering target for optical recording media characterized in that letting the sum of the respective composition ratios alpha, beta, gamma, delta (atom%) be 100, their ranges are 0.1&lt;=alpha&lt;=10, 0.1&lt;=beta&lt;=10, 60&lt;=gamma&lt;=90, 10&lt;=delta&lt;22. An optical recording medium made of the alloy is also disclosed. Few particles are produced during sputtering, and consequently a high-quality thin film is stably formed. The optical recording medium hardly causes an error of record bits and has a high recording density.</p>
申请公布号 WO2005005683(A1) 申请公布日期 2005.01.20
申请号 WO2004JP05395 申请日期 2004.04.15
申请人 NIKKO MATERIALS CO., LTD.;TAKAHASHI, HIDEYUKI 发明人 TAKAHASHI, HIDEYUKI
分类号 G11B7/243;G11B7/26;C23C14/34;(IPC1-7):C23C14/34;G11B7/24;B41M5/26 主分类号 G11B7/243
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