| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an EUV irradiation source with high EUV conversion efficiency. <P>SOLUTION: The EUV irradiation source (40) has a nozzle (42) arranged with a sufficient distance from a target area (50), and constructed so that the EUV irradiation (56) generated at the target area (50) by a laser beam (54) emitted from the nozzle (42) hitting a target flow (46) is absorbed not too much in the target vapor generated in the vicinity of the nozzle (42). The EUV irradiation (56) does not corrodes the nozzle (42) too much, and does not pollutes the irradiation source optical system (34). In one embodiment, the target (42) is isolated from the target area (50) by 10 cm or farther. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
