发明名称 LIGHT SOURCE DEVICE FOR EXTREME ULTRAVIOLET LITHOGRAPHY
摘要 <P>PROBLEM TO BE SOLVED: To provide a light source device for extreme ultraviolet lithography which uses fine tin particles as a luminous material, and obtains high conversion efficiency by adjusting the density of the tin particles to the optimum value. <P>SOLUTION: The light source device for extreme ultraviolet lithography utilizing the light emitted from laser generating plasma uses a luminous material tape formed by applying a binder containing the fine particles of the luminous material at a prescribed rate to the base of a plastic film tape as a target for generating plasma by projecting laser light. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005019441(A) 申请公布日期 2005.01.20
申请号 JP20030178081 申请日期 2003.06.23
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 MATSUSHIMA ISAO;TOMIE TOSHIHISA
分类号 H05H1/24;H01L21/027;H05G2/00 主分类号 H05H1/24
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