发明名称 |
INSPECTION DEVICE USING ELECTRON BEAM |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an inspection device using an electron beam and capable of providing a stable inspection result by preventing degradation of inspection sensitivity by efficiently detecting an information signal. <P>SOLUTION: This inspection device is used for detecting a defect of a sample by generating an image from an information signal obtained by irradiating the sample with an electron beam. The inspection device is equipped with a lens control means for controlling excitation of a focusing lens and an objective lens so as to increase or decrease it when a negative voltage of a retarding voltage applied to the sample in order to decelerate the electron beam immediately before the sample is increased to the positive side or the negative side. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
申请公布号 |
JP2005019258(A) |
申请公布日期 |
2005.01.20 |
申请号 |
JP20030183713 |
申请日期 |
2003.06.27 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
SASAKI HIROKO;KASAI YUJI;TANIMOTO NORIFUMI;SHINADA HIROYUKI;MAKINO HIROSHI;TAKATO ATSUKO |
分类号 |
G03F1/84;H01J37/141;H01J37/244;H01J37/28;H01L21/027;H01L21/66;(IPC1-7):H01J37/28;G03F1/08 |
主分类号 |
G03F1/84 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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