| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography projection apparatus having a clamp means for clamping a substrate on a substrate holder, and a device manufacturing method and a device manufactured by the same. SOLUTION: The lithography projection apparatus includes a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning means which acts to pattern the projection beam according to a desired pattern; a substrate holder having a plurality of first protrusions, of which distal end defines a first contact surface for contacting a substrate; a clamp means on the substrate holder, for clamping the substrate against the first contact surface; and a projection system for projecting the patterned beam to a target portion of the substrate. The substrate holder includes a plurality of second protrusions of which distal defines a second contact surface supporting the substrate. When clamping the substrate against the substrate holder, the second contact surface of the second protrusions substantially coincides with the first contact surface. When the substrate is clamped against the first contact surface, but when it is not clamped, a wafer is disposed separately from the first contact surface. COPYRIGHT: (C)2005,JPO&NCIPI |
