发明名称 METHOD FOR MANUFACTURING MAGNETORESISTIVE HEAD AND METHOD FOR MANUFACTURING HEAD GIMBAL ASSEMBLY PROVIDED WITH THE HEAD
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing an MR head capable of reliably performing ESD (ElectroStatic discharge) protection before assembly of an HGA (Head Gimbal Assembly) without excessively occupying a wafer surface. SOLUTION: The method for manufacturing the MR head comprises the steps of: forming a plurality of thin film MR heads on a substrate (wafer); forming thin film shorting patterns on the wafer surface to electrically short pairs of thin film connecting pads which are electrically connected to the respective MR heads; and then electrically cutting the shorting patterns by laser irradiation in a prescribed process. The method for manufacturing the HGA provided with such MR head is also provided. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005018847(A) 申请公布日期 2005.01.20
申请号 JP20030179678 申请日期 2003.06.24
申请人 SHINKA JITSUGYO KK 发明人 SHIRAISHI KAZUMASA
分类号 G11B5/39;H01L21/301;(IPC1-7):G11B5/39 主分类号 G11B5/39
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