| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To enhance the pattern matching precision of front side and back side in a drawing aparatus. <P>SOLUTION: This drawing aparatus 10 is provided with: an optical unit 12 which can draw circuit patterns and reference marks on the front surface and the back surface of a substrate S; and CCD cameras 20, 22 for measuring the relative positions of the reference marks P1, P2. After drawing the circuit pattern and the reference marks P1, P2 on the surface of the substrate S with the optical unit 12, the substrate S is turned over, and the relative positions of the reference marks P1, P2 on the surface are measured by using the CCD cameras 20, 22, and the drawn positions of the circuit pattern on the back surface relative to the circuit pattern on the front surface are adjusted based on the measured relative positions of the reference marks P1, P2, and the circuit pattern is drawn on the back surface of the substrate with the optical unit 12. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
