METHOD FOR VERIFYING PROXIMITY EFFECT CORRECTION AND VERIFICATION APPARATUS THEREFOR

摘要

PROBLEM TO BE SOLVED: To produce an OPC (optical proximity correction) pattern of high accuracy in a short period of time by efficiently determining whether quantitative deviation in positions is caused by the logical fault of the OPC or not.

SOLUTION: A portion where the transfer accuracy is degraded is detected by comparing with a noncorrected simulation image. Specifically, the direction of the deviation of the OPC pattern with respect to the design pattern is compared with the direction of the deviation of the simulated transfer image of the design pattern with respect to the design pattern and the portion where the directions of the deviation coincide is determined as an error.

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