发明名称 Thin film patterning method by optical lithography, e.g. for bio-chip manufacture, by forming evanescent sections in thin film to increase their solubility
摘要 <p>To increase the solubility of a thin film (6), it is brought into contact with an optical element which guides visible or ultraviolet light (3) by means of total reflection or as a single mode, to form evanescent sections in the thin film. The evanescent sections penetrate the thin films, causing an increased solubility in the thin film, limited to the extent of the evanescent film. An independent claim is included for an apparatus for carrying out the method.</p>
申请公布号 DE10326223(A1) 申请公布日期 2005.01.20
申请号 DE2003126223 申请日期 2003.06.11
申请人 TECHNISCHE UNIVERSITAET DRESDEN 发明人 STEINER, GERALD;ZIMMERER, CORDELIA;SALZER, REINER
分类号 G03F7/20;(IPC1-7):G03F7/20 主分类号 G03F7/20
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