| 摘要 |
<p>Disclosed is an exposure apparatus for projecting and exposing a pattern image on a substrate (P) via a liquid (1) in an immersion region formed on the substrate (P) and a projection optical system (PL). The exposure apparatus comprises a liquid supply mechanism which has a feed opening (13A, 14A) for supplying the liquid (1) on either side of a projection area (AR1) on which the pattern image is projected and is capable of feeding the liquid (1) through the feed openings (13A, 14A) at the same time. Actually, the liquid supply mechanism begins supply of the liquid (1) through only one of the feed openings (13A, 14A), namely through the feed opening (13A). The liquid may be supplied while moving an object such as a substrate placed opposite to the projection optical system. With this structure, an optical path space on the image side of the projection optical system can be filled with the liquid quickly while suppressing formation of air bubbles.</p> |
