发明名称 SUBSTRATE HOLDING DEVICE, SUBSTRATE TREATING DEVICE USING IT, METHOD OF HOLDING SUBSTRATE, AND METHOD OF TREATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To make the states of pinching members which pinch a substrate surely detectable through a simple adjusting work. SOLUTION: A spin chuck 1 has a rotary shaft 25 and a plurality of pinching members F2 which pinch a wafer W, and, at the same time, can cancel the pinching state. A substrate holding device is provided with interlocked rings 34 and 44 which rotate together with the spin chuck 1 so as to surround the rotary shaft 25 and, in addition, move upward and downward in an interlocked state with the operations of the pinching members F2. The heights of the rings 34 and 44 are detected by means of a position sensor. The sensor outputs detect signals which continuously vary in accordance with the heights of the rings 34 and 44. The output of the position sensor is digitized and the state (opened state, pinching state, substrate slipping state, and no-wafer state) of the pinching members F2 is discriminated based on the digitized positional information. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005019456(A) 申请公布日期 2005.01.20
申请号 JP20030178334 申请日期 2003.06.23
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 NAKAGAWA HITOSHI
分类号 C23F1/08;H01L21/304;H01L21/306;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 主分类号 C23F1/08
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