发明名称 PLATING BATH FOR FORMING THIN FILM RESISTANCE LAYER, THIN FILM RESISTANCE LAYER FORMING METHOD, CONDUCTIVE BASE MATERIAL WITH THIN FILM RESISTANCE LAYER, AND CIRCUIT BOARD MATERIAL WITH RESISTANCE LAYER
摘要 PROBLEM TO BE SOLVED: To provide a plating bath for coating a roughed conductive base material with a thin film resistance layer having a uniform thickness, the conductive base material with the thin film resistance layer showing a stable restance, and a restance circuit board material using the condcutive base material with the thin film resitance layer. SOLUTION: The plating bath for coating the conductive base material with the thin film resistance layer is characterised by containing copper as an essential component, at least one of salts from among the salts of phosphoric acid, phosphorous acid, and phosphinic acid, and also at least one of nickel, cobalt, and chromium. The conductive base material with the thin film resistance layer formed in the plating bath is used for the resistance circuit board material. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005019915(A) 申请公布日期 2005.01.20
申请号 JP20030186171 申请日期 2003.06.30
申请人 FURUKAWA CIRCUIT FOIL KK 发明人 KIKUCHI YUUKI;SUZUKI YUJI;OTSUKA HIDEO;MATSUMOTO SADAO;MATSUDA AKIRA
分类号 H05K1/16;(IPC1-7):H05K1/16 主分类号 H05K1/16
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